vapor deposition equipment
- vapor deposition equipment
- garinio nusodinimo įrenginys
statusas T sritis radioelektronika
atitikmenys: angl. vapor deposition equipment
vok. Bedampfungsanlage, f
rus. установка осаждения из паровой фазы, f
pranc. équipement de déposition en phase vapeur, m
Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“.
Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas.
2000.
Look at other dictionaries:
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
équipement de déposition en phase vapeur — garinio nusodinimo įrenginys statusas T sritis radioelektronika atitikmenys: angl. vapor deposition equipment vok. Bedampfungsanlage, f rus. установка осаждения из паровой фазы, f pranc. équipement de déposition en phase vapeur, m … Radioelektronikos terminų žodynas
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… … Wikipedia
Cathodic arc deposition — or Arc PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique is can be used to deposit a… … Wikipedia
Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… … Wikipedia
Aixtron — Infobox Company company name = Aixtron AG company company type = Public (FWB|AIX, NASDAQ|AXTMF) foundation = 1983 location = Aachen, Germany key people = Kim Schindelhauer (Chairman of the supervisory board), Paul Hyland (President and CEO)… … Wikipedia
Bedampfungsanlage — garinio nusodinimo įrenginys statusas T sritis radioelektronika atitikmenys: angl. vapor deposition equipment vok. Bedampfungsanlage, f rus. установка осаждения из паровой фазы, f pranc. équipement de déposition en phase vapeur, m … Radioelektronikos terminų žodynas
garinio nusodinimo įrenginys — statusas T sritis radioelektronika atitikmenys: angl. vapor deposition equipment vok. Bedampfungsanlage, f rus. установка осаждения из паровой фазы, f pranc. équipement de déposition en phase vapeur, m … Radioelektronikos terminų žodynas
установка осаждения из паровой фазы — garinio nusodinimo įrenginys statusas T sritis radioelektronika atitikmenys: angl. vapor deposition equipment vok. Bedampfungsanlage, f rus. установка осаждения из паровой фазы, f pranc. équipement de déposition en phase vapeur, m … Radioelektronikos terminų žodynas